Electric lamp and discharge devices: systems – Pulsating or a.c. supply – Plural load device systems
Patent
1974-10-18
1980-11-25
Behrend, Harvey E.
Electric lamp and discharge devices: systems
Pulsating or a.c. supply
Plural load device systems
3151117, G21B 100
Patent
active
042356687
ABSTRACT:
A high temperature plasma is confined in the shape of a topological torus by a topologically stable magnetic field which is everywhere constant on and tangent to the surface of the torus. There are exactly an even finite number of closed magnetic field lines on the plasma surface and all other magnetic field lines on the surface are asymptotic to the closed field lines. This magnetic field configuration is achieved by a set of current carrying conductors appropriately arranged with respect to the plasma and carrying suitably selected currents.
REFERENCES:
patent: 3009080 (1961-11-01), Loos
patent: 3088894 (1963-05-01), Koenig
patent: 3219534 (1965-11-01), Furth
patent: 3278384 (1966-10-01), Lenard et al.
patent: 3663362 (1972-05-01), Stix
patent: 3677890 (1972-07-01), Hartman
patent: 3692626 (1972-09-01), Ohkawa
Soviet Physics--Technical Physics, vol. 7, No. 3, 9/62, pp. 187-191 by Skornyakov.
Physics of Fluids, vol. 9, 1966, pp. 2295, 2296 by Yoshikawa et al.
Technology Review, 12/76, pp. 20-24, 33-39, 41-43.
MATT-1050, 8/74, pp. 526-529.
ERDA-28, 1/75, pp. 1-3, 8-10.
Bulletin of the American Physical Society, 11/16/71, p. 1239, by Bass.
Proceedings of the Utah Academy of Sciences, Arts, & Letters, vol. 50, part 2, 1973, by Gardner et al., pp. 1-11.
Bass Robert W.
Ferguson Helaman R. P.
Fletcher Harvey J.
Gardner John H.
Harrison B. Kent
Behrend Harvey E.
Brigham Young University
Kirsch Jules P.
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