Conductive spacer lightly doped drain (LDD) for hot carrier effe

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257344, 257410, H01L 2976, H01L 2994, H01L 31062

Patent

active

058313192

ABSTRACT:
A Metal Oxide Semiconductor Field Effect Transistor (MOSFET) with limited susceptibility to Hot Carrier Effects (HCEs), and a method by which that MOSFET is formed. There is first provided a semiconductor substrate which has a first portion, a second portion adjoining a side of the first portion and a third portion adjoining an opposite side of the first portion. Formed upon the first portion of the semiconductor substrate is a gate oxide layer which has a gate electrode formed and aligned thereupon. The gate electrode has a first sidewall adjoining the second portion of the semiconductor substrate and a second sidewall adjoining the third portion of the semiconductor substrate. Formed upon the first sidewall of the gate electrode and upon the surface of the second portion of the semiconductor substrate adjoining the first sidewall is a conformal oxide layer. The conformal oxide layer has a dose of fluorine atoms incorporated therein. Formed upon the conformal oxide layer at a location above the second portion of the semiconductor substrate and adjoining the first sidewall of the gate electrode is a conductive spacer. Formed into the second portion of the semiconductor substrate at a location adjoining the conductive spacer and further removed from the gate electrode is a source electrode. Formed into the third portion of the semiconductor substrate is a drain electrode.

REFERENCES:
patent: 4868617 (1989-09-01), Chiao et al.
patent: 5108935 (1992-04-01), Rodder
patent: 5243212 (1993-09-01), Williams
patent: 5393676 (1995-02-01), Anjum et al.
Wolf, Silicon Processing for the VLSI Era, vol. 3-The Submicron Mosfet Lattice Press, Sunset Beach, CA (1995), pp. 106-112.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Conductive spacer lightly doped drain (LDD) for hot carrier effe does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Conductive spacer lightly doped drain (LDD) for hot carrier effe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Conductive spacer lightly doped drain (LDD) for hot carrier effe will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-692479

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.