Conditioner for a polishing pad and method therefor

Details Conditioner for a polishing pad and method therefor Conditioner for a polishing pad and method therefor

1993-12-20

1995-10-10

Lavinder, Jack W.

Abrading

Precision device or process - or with condition responsive...

With feeding of tool or work holder

451 56, 451 57, 451 63, 451 67, B24B 4918, B24B 5302

Patent

active

054566274

ABSTRACT:
An axially rotating circular polishing pad is conditioned by a rotating end effector that has an abrasion disc in contact with a polishing surface of the pad. The end effector moves along a radius of the polishing pad surface at a velocity that varies to compensate for locations on the polishing pad surface having linear velocities that are directly related to their respective radii. A desired contact force is maintained between the end effector and the polishing pad surface.

REFERENCES:
patent: 3903651 (1975-09-01), Suzuki et al.
patent: 4813830 (1989-03-01), Genequand et al.
patent: 4873792 (1989-10-01), Linke et al.
patent: 4884941 (1989-12-01), Kazerooni
patent: 5003730 (1991-04-01), Halvorsen
patent: 5138799 (1992-08-01), Buckingham et al.
patent: 5154021 (1992-10-01), Bombardier et al.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5245796 (1993-09-01), Miller
patent: 5291693 (1994-03-01), Nguyen

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