Conditioner disk for use in chemical mechanical polishing

Details Conditioner disk for use in chemical mechanical polishing Conditioner disk for use in chemical mechanical polishing

2003-04-08

2008-05-06

Eley, Timothy V. (Department: 3724)

Abrading

Machine

Combined

C451S443000, C451S527000, C451S529000, C451S551000

Reexamination Certificate

active

07367872

ABSTRACT:
A conditioner disk for use on a polish pad in chemical mechanical polishing process includes a base structure a plurality of curved blades supported by the base structure. The blades radiate outwardly from a center region of the base structure and curve in a common direction.

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International Search Report and Written Opinion Application Serial No. PCT/US2004/33960, May 11, 2005, 12 pp.

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