X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1993-05-11
1994-11-01
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 85, 359851, 359861, G21K 106
Patent
active
053612922
ABSTRACT:
A series of segments of a parent aspheric mirror having one foci at at a si-point source of radiation and the other foci at the radius of a ring field have all but one or all of their beams translated and rotated by sets of mirrors such that all of the beams pass through the real entrance pupil of a ring field camera about one of the beams and fall onto the ring field radius as a coincident image as an arc of the ring field.
REFERENCES:
patent: 4861148 (1989-08-01), Sato et al.
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5107526 (1992-04-01), Hoover
patent: 5131023 (1992-07-01), Yasugaki et al.
patent: 5136413 (1992-08-01), MacDonald et al.
patent: 5153898 (1992-10-01), Suzuki et al.
Cone Gregory A.
Porta David P.
The United States of America as represented by the Department of
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