Concentric proximity processing head

Details Concentric proximity processing head Concentric proximity processing head

2005-10-18

2005-10-18

Gravini, Stephen (Department: 3749)

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

C034S092000

Reexamination Certificate

active

06954993

ABSTRACT:
In one of the many embodiments, a method for processing a substrate is disclosed which includes generating a first fluid meniscus and a second fluid meniscus at least partially surrounding the first fluid meniscus wherein the first fluid meniscus and the second fluid meniscus are generated on a surface of the substrate.

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