Concentric platens

Details Concentric platens Concentric platens

1998-12-14

2000-11-28

Eley, Timothy V.

Abrading

Abrading process

Utilizing fluent abradant

451 57, 451 65, 451287, 451288, 451527, 451529, 451550, B24B 100, B24B 2900

Patent

active

061528064

ABSTRACT:
A chemical mechanical polishing apparatus includes a plurality of concentric rotatable platens for polishing a substrate. A polishing pad is attached to each platen. Each platen may be rotated independently in either clockwise or counter-clockwise direction.

REFERENCES:
patent: 3841031 (1974-10-01), Walsh
patent: 5658185 (1997-08-01), Morgan, III et al.
patent: 5951380 (1999-09-01), Kim
patent: 5972162 (1999-10-01), Cesna
patent: 5975991 (1999-11-01), Karlsrud
patent: 6015337 (2000-01-01), Hiyama et al.

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