Computer-readable medium that contains software for...

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2006-06-23

2008-12-16

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Control means responsive to a randomly occurring sensed...

C118S7230ER, C156S345470, C156S345240, C134S001100

Reexamination Certificate

active

07465357

ABSTRACT:
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

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