Compounds useful as chemical precursors in chemical vapor deposi

Details Compounds useful as chemical precursors in chemical vapor deposi Compounds useful as chemical precursors in chemical vapor deposi

1995-01-26

1997-04-01

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

556410, 556412, 556431, 556432, 556435, C07P 708, C07F 710

Patent

active

056167547

ABSTRACT:
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.

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