Compounds containing tetradecachlorocyclohexasilane dianion

Details Compounds containing tetradecachlorocyclohexasilane dianion Compounds containing tetradecachlorocyclohexasilane dianion

1998-03-30

1999-08-24

Shaver, Paul F.

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

568 9, 568 17, 423341, 423342, C07F 708, C07F 710

Patent

active

059426373

ABSTRACT:
Compounds containing a tetradecachlorocyclohexasilane dianion are prepared by contacting trichlorosilane with a reagent composition comprising a N,N,N',N",N"-pentaethyldiethylenetriamine is prepared by contacting with a mixture of N,N,N',N'-tetraethylethylenediamine and triphenylphosphonium chloride. The tetradecachlorocyclohexasilane dianion can be chemically reduced to cyclohexasilane, a compound useful in the deposition of amorphous silicon films. The tetradecachlorcyclohexasilane dianion can also be contacted with a Grignard reagent to form a dodecaorganocyclohexasilane.

REFERENCES:
patent: 4841083 (1989-06-01), Nagai et al.
Kaczmarczyk et al. Journal of American Chemical Society, vol. 82, p. 751, 1960.
Kaczmarczyk et al. Journal of Inorganic Nuclear Chemistry, vol. 17, pp. 186-188, 1961.
Wiber et al. Angew. Chem. Int. Ed., vol. 1, No. 9, p. 517, 1962.
Hengge et al. Angew. Chem. Int. Ed., vol. 16, No. 6, p. 403, 1977.

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