Compound used to form a self-assembled monolayer, layer...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S040000, C257SE51007, C257SE29291, C257SE29294, C257SE21299, C257SE21440, C438S099000, C438S158000, C977S936000

Reexamination Certificate

active

11313250

ABSTRACT:
Embodiments of the invention provide a semiconductor component and a method of manufacture thereof. A semiconductor component comprises: a gate electrode layer adjacent a substrate, and a gate dielectric layer adjacent the gate electrode layer. The gate dielectric layer comprises a monolayer of at least one compound, wherein the compound has an aromatic or a condensed aromatic molecular group. The molecular group is capable of π-π interactions, which stabilize the monolayer. In an embodiment, the semiconductor component is an organic field effect transistor (OFET). In an embodiment of the invention, a method includes forming the monolayer using a liquid phase immersion process.

REFERENCES:
patent: 4539061 (1985-09-01), Sagiv
patent: 5686549 (1997-11-01), Grainger et al.
patent: 5728431 (1998-03-01), Bergbreiter et al.
patent: 5783648 (1998-07-01), Bergbreiter et al.
patent: 6433359 (2002-08-01), Kelley et al.
patent: 2001/0055768 (2001-12-01), Nakamura et al.
patent: 2002/0057398 (2002-05-01), Ogawa
patent: 2002/0167003 (2002-11-01), Campbell et al.
patent: 2003/0157798 (2003-08-01), Gabric et al.
patent: 2003/0175551 (2003-09-01), Smith et al.
patent: 2004/0241590 (2004-12-01), Park et al.
patent: 198 15 220 (1999-09-01), None
patent: 697 08 331 (2002-07-01), None
patent: 102 07 130 (2003-09-01), None
patent: 0 978 499 (2001-11-01), None
patent: 1 179 863 (2002-02-01), None
patent: 2003-092411 (2003-03-01), None
patent: WO 02/086979 (2002-10-01), None
patent: WO 03/023517 (2003-03-01), None
patent: WO 03/077327 (2003-09-01), None
Tillman, N., et al., “Incorporation of Phenoxy Groups in Self-Assembled Monolayers of Trichlorosilane Derivatives: Effects on Film Thickness, Wettability, and Molecular Orientation,” J. Am. Chem. Soc., vol. 110, No. 18, 1988, pp. 6136-6144. (XP-002299960).
Tillman, N., et al., “A Novel Self-Assembled Monolayer Film Containing a Sulfone-Substituted Aromatic Group,” Langmuir, vol. 6, No. 9, 1990, pp. 1512-1518. (XP-002300327).
Collet, J., et al., “Nano-field effect transistor with an organic self-assembled monolayer as gate insulator,” Applied Physics Letters, vol. 73, No. 18, Nov. 2, 1998, pp. 2681-2683.
Lackowski, W.M., et al., “Micron-Scale Patterning of Hyperbranched Polymer Films by Micro-Contact Printing,” J. Am. Chem. Soc., vol. 121, No. 6, 1999, pp. 1419-1420 (published on the web Feb. 2, 1999).
Ghosh, P., et al., “Covalent Grafting of a Patterned, Hyperbranched Polymer onto a Plastic Substrate Using Microcontact Printing,” J. Am. Chem. Soc., vol. 121, No. 36, 1999, pp. 8395-8396. (published on the web Aug. 31, 1999).
Collet, J., et al., “High anisotropic conductivity in organic insulator/semiconductor monolayer heterostructure,” Applied Physics Letters, vol. 76, No. 10, Mar. 6, 2000, pp. 1339-1341.
Collet, J., et al., “Low-voltage, 30 nm channel length, organic transistors with a self-assembled monolayer as gate insulating films,” Applied Physics Letters, vol. 76, No. 14, Apr. 3, 2000, pp. 1941-1943.
Gershevitz, O., et al., “Molecular Monolayer-Mediated Control over Semiconductor Surfaces: Evidence for Molecular Depolarization of Silane Monolayers on Si/SiOx,” J. Am. Chem. Soc., vol. 125, No. 16, 2003, pp. 4730-4731. (published on the web Apr. 1, 2003) (XP-002299959).
Turgeman, R., et al., “Oriented Growth of ZnO Crystals on Self-Assembled Monolayers of Functionalized Alkyl Silanes,” Crystal Growth & Design, vol. 4, No. 1, 2004, pp. 169-175. (published on the web Sep. 26, 2003) (XP-002299963).
Gershewitz, O., et al., “Effect of Molecule-Molecule Interaction on the Electronic Properties of Molecularly Modified Si/SiOxSurfaces,” J. Phys. Chem. B, vol. 108, No. 2, 2004, pp. 664-672. (published on the web Dec. 13, 2003) (XP-002299962).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Compound used to form a self-assembled monolayer, layer... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compound used to form a self-assembled monolayer, layer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compound used to form a self-assembled monolayer, layer... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3856134

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.