Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-01-04
2011-01-04
Kelly, Cynthia H (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C568S720000
Reexamination Certificate
active
07862981
ABSTRACT:
A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11to R17each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.
REFERENCES:
patent: 5658706 (1997-08-01), Niki et al.
patent: 5693452 (1997-12-01), Aoai et al.
patent: 5707776 (1998-01-01), Kawabe et al.
patent: 5824451 (1998-10-01), Aoai et al.
patent: 5837420 (1998-11-01), Aoai et al.
patent: 5844057 (1998-12-01), Watanabe et al.
patent: 5994025 (1999-11-01), Iwasa et al.
patent: 6037098 (2000-03-01), Aoai et al.
patent: 6106993 (2000-08-01), Watanabe et al.
patent: 6197473 (2001-03-01), Kihara et al.
patent: 6638683 (2003-10-01), Tan et al.
patent: 7220808 (2007-05-01), Yamagishi et al.
patent: 7504196 (2009-03-01), Shiono et al.
patent: 2002/0025495 (2002-02-01), Ogata et al.
patent: 2002/0058205 (2002-05-01), Nakashima et al.
patent: 2003/0232277 (2003-12-01), Sasaki et al.
patent: 2004/0005512 (2004-01-01), Mizutani et al.
patent: 2004/0234885 (2004-11-01), Watanabe et al.
patent: 2005/0271971 (2005-12-01), Ueda et al.
patent: 2007/0259273 (2007-11-01), Shiono et al.
patent: 2007/0281243 (2007-12-01), Hirayama
patent: 2008/0020288 (2008-01-01), Hirayama et al.
patent: 2008/0145784 (2008-06-01), Shiono et al.
patent: 2009/0162781 (2009-06-01), Shiono et al.
patent: H05-061197 (1993-03-01), None
patent: H05-249681 (1993-09-01), None
patent: H06-059444 (1994-03-01), None
patent: H06-167811 (1994-06-01), None
patent: H06-266109 (1994-09-01), None
patent: 08-193054 (1996-07-01), None
patent: H08-220740 (1996-08-01), None
patent: 08-262712 (1996-10-01), None
patent: H08-337616 (1996-12-01), None
patent: H09-005999 (1997-01-01), None
patent: H09-160246 (1997-06-01), None
patent: H09-211866 (1997-08-01), None
patent: H10-123703 (1998-05-01), None
patent: A 10-274845 (1998-10-01), None
patent: A-11-153863 (1999-06-01), None
patent: H11-167199 (1999-06-01), None
patent: H11-199533 (1999-07-01), None
patent: 2000-086584 (2000-03-01), None
patent: 2000-305270 (2000-11-01), None
patent: 2000-330282 (2000-11-01), None
patent: 2001-312055 (2001-11-01), None
patent: 2002-099088 (2002-04-01), None
patent: 2002-099089 (2002-04-01), None
patent: 2002-221787 (2002-08-01), None
patent: A-2002-328473 (2002-11-01), None
patent: A-2003-084437 (2003-03-01), None
patent: 2003-183227 (2003-07-01), None
patent: 2003-260881 (2003-09-01), None
patent: 2004-062049 (2004-02-01), None
patent: 2004-125835 (2004-04-01), None
patent: 2004-151605 (2004-05-01), None
patent: A-2004-191913 (2004-07-01), None
patent: 2004-302440 (2004-10-01), None
patent: 2004-359590 (2004-12-01), None
patent: 2002-055452 (2005-02-01), None
patent: 2005-089387 (2005-04-01), None
patent: 2005-091909 (2005-04-01), None
patent: 2005-309421 (2005-11-01), None
patent: 0231242 (1997-05-01), None
patent: 2001-0088341 (2001-09-01), None
patent: 10-0406242 (2003-11-01), None
patent: 200302397 (2003-08-01), None
patent: 200617602 (2006-06-01), None
patent: WO 2006/046383 (2006-05-01), None
International Search Report in connection with corresponding PCT application No. PCT/JP2006/311443, dated Jun. 7, 2006.
European Search Report issued on counterpart European Patent Application No. EP 05788289.6, dated Jul. 26, 2010.
Hirayama, T., et al. “Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists”, The Japan Journal of Applied Physics, vol. 44, No. 7B, 2005, pp. 5484-5488 (published on Jul. 26, 2005).
Hirayama et al. “Development of Electron Beam Resists Based on Amorphous Polyphenols with Low Molecular Weight and Narrow Dispersion,” Proceedings of SPIE, vol. 5753, pp. 738-745.
Hirayama et al., Journal of Photopolymer Science and Technology, vol. 17, No. 3, 435-440, (2004).
Yamaguchi et al., Linewidth fluctuations caused by polymer aggregates in resist films, Journal of Photopolymer Science and Technology, vol. 10, No. 4, pp. 635-640, (1997).
Hirayama et al, “Development of Amorphous PolyPhenol Resists with Low Molecular Weight and Narrow Dispersion for EB Lithography”, IEEE Xplore, Oct. 22, 2004, pp. 10-11.
Hada Hideo
Hirayama Taku
Shiono Daiju
Johnson Connie P
Kelly Cynthia H
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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