Compound, photosensitive composition, lithographic printing...

Details Compound, photosensitive composition, lithographic printing... Compound, photosensitive composition, lithographic printing...

2007-01-30

2007-01-30

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S311000, C430S302000, C548S100000

Reexamination Certificate

active

10838316

ABSTRACT:
A compound having a novel structure and a photo-sensitive composition comprising (i) the novel compound as a sensitizing dye, (ii) an activator compound generating at least one of a radical and an acid by interacting the activator compound with light absorption of the sensitizing dye to cause chemical change, and (iii) a compound changing its physical or chemical property irreversibly by a reaction with at least one of the radical and the acid.

REFERENCES:
patent: 6335144 (2002-01-01), Murota et al.
patent: 1 048 982 (2000-11-01), None
patent: 1 091 247 (2001-04-01), None
patent: 1 288 720 (2003-03-01), None
patent: 1471387 (2004-10-01), None
patent: 1491536 (2004-12-01), None
patent: 2000-258910 (2000-09-01), None
English language machine translation of JP 2003-221517.
European Search Report dated Nov. 17, 2004.

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