Compound, method for producing same, positive resist...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C568S720000

Reexamination Certificate

active

07960089

ABSTRACT:
A compound of the present invention is a compound represented by a general formula (A-1) [wherein, R′ represents a hydrogen atom or an acid-dissociable, dissolution-inhibiting group, provided that at least one R′ group is an acid-dissociable, dissolution-inhibiting group, R11to R17each represent an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each represent an integer of 1 or greater, and k and q each represent an integer of 0 or greater, provided that g+j+k+q is not greater than 5; a represents an integer from 1 to 3; b represents an integer of 1 or greater, and l and m each represent an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represent an integer of 0 or greater, provided that c+n+o is not greater than 4; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown below, or an aliphatic cyclic group].

REFERENCES:
patent: 5945517 (1999-08-01), Nitta et al.
patent: 6180313 (2001-01-01), Yukawa et al.
patent: 7504196 (2009-03-01), Shiono et al.
patent: 7659047 (2010-02-01), Kojima et al.
patent: 2008/0113294 (2008-05-01), Echigo et al.
patent: 2008/0145784 (2008-06-01), Shiono et al.
patent: 09-208554 (1997-08-01), None
patent: 11-35551 (1999-02-01), None
patent: 11-35552 (1999-02-01), None
patent: 11-35573 (1999-02-01), None
patent: 11-322707 (1999-11-01), None
patent: 2001-312055 (2001-09-01), None
patent: 2001-312055 (2001-11-01), None
patent: 2006-039281 (2006-02-01), None
patent: 2006-267996 (2006-10-01), None
patent: WO 2004-074242 (2004-09-01), None
Hirayama et al., Journal of Photopolymer Science and Technology, vol. 17 No. 3, pp. 435-440, (2004).
Kim et al.,Novel Molecular Resist Based on Derivative of Cholic Acid, Chemistry Letters, pp. 1064-1065, (2002).
International Search Report in connection with corresponding PCT application No. PCT/JP2006/318151, dated Nov. 28, 2006.

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