Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-07-16
2010-06-29
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C430S921000, C430S922000, C562S041000, C562S044000, C562S109000, C562S113000
Reexamination Certificate
active
07745097
ABSTRACT:
There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern.(wherein, R1represents an aryl group or alkyl group which may contain a substituent group; R3represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1and R3may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1is bonded and the carbon atom with which R3is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).
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Office Action issued in counterpart Korean Patent Application No. 10-2008-0068190, dated Dec. 9, 2009.
Hada Hideo
Ishiduka Keita
Iwai Takeshi
Kawaue Akiya
Seshimo Takehiro
Chu John S
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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