Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-06-07
2011-06-07
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S905000, C562S041000, C562S044000
Reexamination Certificate
active
07955777
ABSTRACT:
There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1]in-line-formulae description="In-line Formulae" end="lead"?X—Q1—Y1—SO3−M+ (I)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?X—Q1—Y1—SO3−A+ (b1-1)in-line-formulae description="In-line Formulae" end="tail"?(wherein, Q1represents a bivalent linking group or a single bond; Y1represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+represents an alkali metal ion; and A+represents an organic cation.).
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Machine translation of JP 2006-162735 (no date).
Office Action issued in counterpart Korean Patent Application No. 10-2008-0068190, dated Dec. 9, 2009.
Ishiduka Keita
Kawaue Akiya
Komuro Yoshitaka
Ohshita Kyoko
Seshimo Takehiro
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
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