Compositions suitable for removing photoresist, photoresist...

Details Compositions suitable for removing photoresist, photoresist... Compositions suitable for removing photoresist, photoresist...

2005-10-04

2005-10-04

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C510S171000, C510S176000

Reexamination Certificate

active

06951710

ABSTRACT:
Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.

REFERENCES:
patent: 5381807 (1995-01-01), Lee et al.
patent: 5381808 (1995-01-01), Kamikawa
patent: 5795702 (1998-08-01), Tanabe et al.
patent: 5911835 (1999-06-01), Lee et al.
patent: 6291142 (2001-09-01), Tanabe et al.
patent: 6455497 (2002-09-01), Goronzy et al.

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