Compositions for positive heat sensitive lithographic...

Details Compositions for positive heat sensitive lithographic... Compositions for positive heat sensitive lithographic...

2007-04-10

2007-04-10

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S302000, C101S453000

Reexamination Certificate

active

10508277

ABSTRACT:
A composition for positive heat sensitive computer-to-plate (CTP) lithographic printing plates comprising a phenolic resin and an IR absorber characterized by the fact that the composition contains from 1 to 30% w/w of an organic oxygenated phosphorous compound chosen from the group of general formula (I):wherein R1, R2, and R3are independently a C4–C8alkyl group or an aryl group.

REFERENCES:
patent: 4772534 (1988-09-01), Kawamura et al.
patent: 2002/0172889 (2002-11-01), Oohashi
patent: 11-084644 (1999-03-01), None

Affiliated with

Also associated with

Rating

Compositions for positive heat sensitive lithographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Compositions for positive heat sensitive lithographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions for positive heat sensitive lithographic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3777688