Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-12-13
2005-12-13
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S907000, C430S322000, C430S325000, C526S281000, C526S242000
Reexamination Certificate
active
06974657
ABSTRACT:
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1′-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: —C(Rf)(Rf′)Orbwherein Rfand Rf′are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)nwherein n is an integer ranging from 2 to about 10 and Rbis a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm−1at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
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Berger Larry L.
Crawford Michael Karl
Feldman Jerald
Johnson Lynda Kaye
Schadt, III Frank Leonard
E. I. du Pont de Nemours and Company
Thornton Yvette C.
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