Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2005-01-04
2005-01-04
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S313000, C430S326000, C430S512000, C430S514000
Reexamination Certificate
active
06838223
ABSTRACT:
A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed. The anti-reflective layer and the photoresist layer are simultaneously developed.
REFERENCES:
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 5229245 (1993-07-01), Lin et al.
patent: 5908738 (1999-06-01), Sato et al.
patent: 5939236 (1999-08-01), Pavelchek et al.
patent: 6110653 (2000-08-01), Holmes et al.
patent: 6372403 (2002-04-01), Kurisaki et al.
patent: 6451503 (2002-09-01), Thackeray et al.
patent: 20030194635 (2003-10-01), Mulligan
Chung Hoe-sik
Kim Young-ho
Ryu Jin-a
Yoon Sang-woong
Chu John S.
Lee & Sterba, P.C.
Samsung Electronics Co,. Ltd.
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