Etching a substrate: processes – Masking of a substrate using material resistant to an etchant
Reexamination Certificate
2011-03-22
2011-03-22
Fortuna, Ana M (Department: 1777)
Etching a substrate: processes
Masking of a substrate using material resistant to an etchant
C210S500270, C210S500280
Reexamination Certificate
active
07910012
ABSTRACT:
A composition is provided. The composition may include a reaction product of a first composition having two or more anhydride moieties, a second composition having two or more hydroxyl moieties, and a third composition having at least one aziridine moiety. A method for forming a membrane from the composition is provided. A membrane formed from the composition is provided. Devices that include the membrane are provided, also.
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PCT International Search Report dated Aug. 28, 2008.
Kogan Anatoli
Oba Sharon
Wang Hua
Yeager Gary William
Fortuna Ana M
General Electric Company
Gioeni Mary Louise
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