Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1992-07-21
1993-11-23
Kight, III, John
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
522 25, 522 31, 522 49, 522 53, 522101, 522102, D04H 108
Patent
active
052643255
ABSTRACT:
An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which preferably is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. A third resin, either an epoxy cresol novolak or a polyepoxy resin, is also added to the resin system. To this resin system is added about 0.1 to about 15 parts by weight per 100 parts of resin of a cationic photoinitiator capable of initiating polymerization of said epoxidized resin system upon exposure to actinic radiation; the system being further characterized by having an absorbance of light in the 330 to 700 nm region of less than 0.1 for a 2.0 mil thick film. Optionally a photosensitizer such as perylene and its derivatives or anthracene and its derivatives may be added.
REFERENCES:
patent: 3794576 (1974-02-01), Watt
patent: 3817906 (1974-06-01), Tsukiok
patent: 4058401 (1977-11-01), Crivello
patent: 4069054 (1978-01-01), Smith
patent: 4069055 (1978-01-01), Crivello
patent: 4081276 (1978-03-01), Crivello
patent: 4138255 (1979-02-01), Crivello
patent: 4175963 (1979-11-01), Crivello
patent: 4246147 (1981-01-01), Bakos et al.
patent: 4250053 (1981-02-01), Smith
patent: 4279985 (1981-07-01), Nonogaki et al.
patent: 4351708 (1982-09-01), Berner et al.
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4544623 (1985-10-01), Audykowski et al.
patent: 4546067 (1985-10-01), Irving et al.
patent: 4548890 (1985-10-01), Dickinson et al.
patent: 4548895 (1985-10-01), Irving et al.
patent: 4578425 (1986-03-01), Santorelli
patent: 4624912 (1986-11-01), Zweifel et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4684671 (1987-08-01), Tsuchiya et al.
patent: 4693961 (1987-09-01), Bauer
patent: 4735891 (1988-04-01), Budde et al.
patent: 4940651 (1990-07-01), Brown et al.
patent: 5026624 (1992-06-01), Day et al.
Allen Robert D.
Day Richard A.
Glatzel Donald H.
Hinsberg William D.
Mertz John R.
International Business Machines - Corporation
Kight III John
Mosley T.
LandOfFree
Composition for photo imaging does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for photo imaging, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for photo imaging will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1848006