Composition for forming low dielectric thin film including...

Details Composition for forming low dielectric thin film including... Composition for forming low dielectric thin film including...

2008-03-04

2008-03-04

Zimmer, Marc S. (Department: 1712)

Coating processes

With post-treatment of coating or coating material

Heating or drying

C427S096100, C427S098400, C427S373000, C428S447000, C524S858000, C524S860000, C528S035000, C528S037000

Reexamination Certificate

active

11218753

ABSTRACT:
Disclosed herein is a composition for forming a low dielectric thin film, which includes silane monomers having only any one of stereoisomer, or a siloxane polymer produced by polymerizing the monomers, and a method of producing the low dielectric thin film using the same. When using the composition, mechanical properties are excellent because tacticity of a matrix is improved, and formation of pores is increased due to a molecular free volume, thus it is possible to produce a low dielectric thin film having low dielectricity.

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O. Shchegolokhina et al., “Synthesis and Properties of Stereoregular Cyclic Polysilanols: cis-[PhSi(O)OH]4rcis-[PhSi(O)OH]6rand Tris-cis-tris-trans-[PhSi(O)OH]12”, Inorganic Chemistry, 2002, vol. 41, No. 25, pp. 6892-6904.
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