Composition for forming low dielectric thin film including...

Coating processes – With post-treatment of coating or coating material – Heating or drying

Reexamination Certificate

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C427S096100, C427S098400, C427S373000, C428S447000, C524S858000, C524S860000, C528S035000, C528S037000

Reexamination Certificate

active

11218753

ABSTRACT:
Disclosed herein is a composition for forming a low dielectric thin film, which includes silane monomers having only any one of stereoisomer, or a siloxane polymer produced by polymerizing the monomers, and a method of producing the low dielectric thin film using the same. When using the composition, mechanical properties are excellent because tacticity of a matrix is improved, and formation of pores is increased due to a molecular free volume, thus it is possible to produce a low dielectric thin film having low dielectricity.

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