Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-11-02
2010-12-07
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S325000, C430S326000, C430S311000, C430S327000, C430S330000, C430S905000
Reexamination Certificate
active
07846638
ABSTRACT:
There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
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Enomoto Tomoyuki
Kawamura Yasuo
Kishioka Takahiro
Mizusawa Ken-ichi
Nakayama Keisuke
Lee Sin J.
Nissan Chemical Industries Ltd.
Oliff & Berridg,e PLC
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