Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-06-01
2008-09-16
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S313000, C430S317000, C430S318000, C430S321000, C430S323000
Reexamination Certificate
active
07425403
ABSTRACT:
A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1):and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.
REFERENCES:
patent: 5332647 (1994-07-01), Ohno et al.
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5919599 (1999-07-01), Meador et al.
patent: 6171749 (2001-01-01), Tachikawa et al.
patent: 2003/0180559 (2003-09-01), Wayton et al.
patent: 0 355 728 (1990-02-01), None
patent: A 56-49548 (1981-05-01), None
patent: A 10-204110 (1998-08-01), None
patent: A 11-279523 (1999-10-01), None
Wojtowicz, J.A., “Cyanuric and Isocyanuric Acids (Archive)”, Kirk-Othmer Encyclopedia of Chemical Technology, Copyright 1993 (John Wiley & Sons, Inc.) article Online posing date Dec. 4, 2000, from sss.mrw.interscience.wiley.com, pp. 13 of 13 and 5 of 5.
Derwent-Acc-No. 1981-45170D Derwent-Week: 198125 Copyright 2006 Derwent Information Ltd Abstract of JP 56049548 A publisrhed May 6, 1981.
Lynch et al, “Properties and performance of near-UV reflectivity control layers (RCL)”, Proceedings of SPIE—vol. 2195, Advances in Resist Technology and Processing X1, Omkaram Nalamasu, Ed, May 1994, pp. 225-235.
Taylor et al, “Methacrylate resists and antireflective coatings for 193-nm lithography”, Proceedings of SPIE—vol. 3678, Advances in Resist Technology and Processing XVI, Will Conley, ed, Jun. 1999, pp. 174-185.
Tom Lynch et al.; “Properties and Performance of Near UV Reflectivity Control Unit”; SPIE, vol. 2195; pp. 225-229.
G. Taylor et al.; “Methacrylate Resists and Antireflective Coatings for 193 nm Lithography”; SPIE, vol. 3678, Mar. 1999; pp. 174-185.
XP-002280987.
XP-002281024.
XP-002281025.
XP-002281026.
Arase Shinya
Kishioka Takahiro
Mizusawa Ken-ichi
Hamilton Cynthia
Nissan Chemical Industries Ltd.
Oliff & Berridg,e PLC
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