Composition for formation of electrode pattern

Details Composition for formation of electrode pattern Composition for formation of electrode pattern

1995-12-27

1997-12-09

Miller, Edward A.

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

2521823, C09K 300

Patent

active

056963840

ABSTRACT:
A Pt film-forming composition comprises a dimethyl Pt(II) (N,N,N',N'-tetramethylethylenediamine) complex and an organic solvent. A Pt film is formed by applying this composition to a substrate and then subjecting the applied layer of the composition to a heat treatment. A Pt film pattern is obtained by applying this composition to a substrate, pattern-exposing the produced applied layer of the composition to radiation, developing the exposed layer, and then subjecting the developed layer to a heat treatment.

REFERENCES:
patent: 3867343 (1975-02-01), Garden
patent: 4472517 (1984-09-01), Tsao et al.
patent: 4764357 (1988-08-01), Sherif et al.
patent: 5252247 (1993-10-01), Greco et al.
patent: 5292594 (1994-03-01), Liburdi et al.
patent: 5410007 (1995-04-01), Lewis et al.
Appleton et al., Chem. Abs., 106, abs. #84805 (1986).

Affiliated with

Also associated with

Rating

Composition for formation of electrode pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composition for formation of electrode pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for formation of electrode pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1609940