Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1995-06-05
1996-08-20
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430909, 430910, G03F 7038
Patent
active
055478123
ABSTRACT:
Microbridge formation in chemically amplified negative tone photoresists based on poly(hydroxystyrene) (PHS) is avoided when the PHS is blended together with a co-polymer of PHS and an acrylic polymer such as poly(methyl methacrylate) (PMMA). The blend should include at least 10% by weight of the co-polymer. In operation, hydrogen bonding between the hydroxystyrene sub-units and the methacrylate sub-units decreases the availability of sites for crosslinking, and this reduction in crosslinking sites makes the blend less susceptible to formation of polymer resist microbridges. The invention is practicable with a polymers having a wide range of molecular weights (2000-50000 daltons), and development can be achieved using the industry standard 2.38 wt % trimethylammonium hydroxide (TMAH) developer without any adverse impact on the photoresist.
REFERENCES:
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4600683 (1986-07-01), Greco et al.
patent: 4612270 (1986-09-01), Pampalone et al.
patent: 4931381 (1990-06-01), Spak et al.
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 5008175 (1991-04-01), Hsieh et al.
patent: 5034304 (1991-07-01), Feely et al.
patent: 5210000 (1993-05-01), Thackeray et al.
patent: 5252435 (1993-10-01), Tani et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5376498 (1994-12-01), Kajita et al.
patent: 5399456 (1995-03-01), Spak et al.
Collins James P.
Dorn Judy
Fahey James T.
Linehan Leo
Miller William J.
Chu John S. Y.
International Business Machines - Corporation
Soucar, Esq. Steven J.
LandOfFree
Composition for eliminating microbridging in chemically amplifie does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for eliminating microbridging in chemically amplifie, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for eliminating microbridging in chemically amplifie will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2329700