Composition for activation energy rays and method of forming...

Details Composition for activation energy rays and method of forming... Composition for activation energy rays and method of forming...

2006-07-18

2006-07-18

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S905000

Reexamination Certificate

active

07078158

ABSTRACT:
A composition for activation energy rays comprising a specific vinyl ether group-containing compound (A) in which a vinyl ether group is bonded to a secondary or tertiary carbon atom, a polymer (B) having a carboxyl group and/or a hydroxyphenyl group, and a photo-acid generator compound (C) can form a resist pattern having an excellent sensitivity without carrying out any heat treatment at a temperature of 60° C. or more after irradiation.

REFERENCES:
patent: 5496678 (1996-03-01), Imai et al.
patent: 5650259 (1997-07-01), Imai et al.
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 6-230574 (1994-08-01), None
patent: 6-308733 (1994-11-01), None
patent: 10-279513 (1998-10-01), None
patent: 2000-267285 (2000-09-01), None
Machine-assisted English translation of JP 10-279513, provided by JPO.

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