Composition and method for removing photoresist composition from

Details Composition and method for removing photoresist composition from Composition and method for removing photoresist composition from

1993-03-10

1995-06-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430169, 430189, 430192, 252 791, G03F 738, C09K 1300

Patent

active

054260175

ABSTRACT:
Ternary mixtures of C.sub.4 to C.sub.8 alkyl acetate, C.sub.4 to C.sub.8 alkyl alcohol, and water, formulated to have a flash point of above 100.degree. F., are disclosed, particularly for use in edge residue removal processes in the fabrication of integrated circuits and like products.

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patent: 4328304 (1982-05-01), Tachikawa et al.
patent: 4746397 (1988-05-01), Maeda et al.
patent: 4946759 (1990-08-01), Doessel et al.
patent: 4965167 (1990-10-01), Salamy
patent: 5030550 (1991-07-01), Kawabe et al.
patent: 5106724 (1992-04-01), Nogami et al.

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