Composition and method for off-axis growth sites on nonpolar sub

Details Composition and method for off-axis growth sites on nonpolar sub Composition and method for off-axis growth sites on nonpolar sub

1993-11-01

1995-08-22

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

437 90, 437234, 117 97, H01L 21306, B44C 122

Patent

active

054436850

ABSTRACT:
Nonpolar substrates comprising off-axis growth regions for the growth of polar semiconductors, and a method for making such substrates, are disclosed. According to the invention, an erodible material, such as a photoresist, is applied to a substrate at a site and is exposed to radiation at that site which has an linear variation in energy at the surface of the erodible material. Due to this variation in exposure energy, a taper results in the erodible material after development. The tapered region is then etched in a manner which etches both the erodible layer and the underlying substrate. The taper in the erodible layer provides a varying attenuation during the etching process such that the taper of the erodible layer is transferred to the substrate.

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