Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1989-08-23
1992-04-28
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430339, 430396, 430312, 430272, 430156, 430509, 430502, G03F 7095, G03C 172
Patent
active
051088746
ABSTRACT:
The image of an object with opaque and transparent regions having a contrast less than the contrast threshold of a layer of photoresist when light of a predetermined wavelength to which the photoresist is sensitive is passed through the object and onto the layer of photoresist is enhanced in contrast by the provision of a contrast enhancing layer contiguous to the surface of the photoresist to a value above the contrast threshold of the photoresist. The contrast enhancing layer is constituted of an aryl nitrone compound mixed with a suitable binder.
REFERENCES:
patent: 2426894 (1947-09-01), McQueen
patent: 3416922 (1968-12-01), Sus et al.
patent: 3511653 (1970-05-01), Wiebe
patent: 3925077 (1975-12-01), Lewis et al.
patent: 3965278 (1976-06-01), Duinker et al.
patent: 4025191 (1977-05-01), Seward, III
patent: 4411978 (1983-10-01), Laridon et al.
H. J. Zweig, "Nonlinear Filter", IBM Technical Disclosure Bulletin, vol. 8, No. 7, Dec., 1965, p. 980.
Jaromir Kosar, Light-Sensitive Systems: Chemistry and Application of Nonsilver Halide Photographic Processes, John Wiley & Sons, Inc., New York, 1965, pp. 269-270.
Skoog and West, "Fundamentals of Analyic Chemistry", 2nd Ed., 1969, pp. 644-652.
"Methoden der Organischen Chemie", (Houben-Weyl), vol. 10, part 4, 1968, pp. 315-416.
Hamer and Macaluso, "Nitrones", Chemical Reviews, 1964, pp. 476-483.
Griffing Bruce F.
West Paul R.
Hamilton Cynthia
MicroSi, Inc.
LandOfFree
Composite useful in photolithography does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composite useful in photolithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composite useful in photolithography will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1248633