Composite photoresist for pattern transferring

Details Composite photoresist for pattern transferring Composite photoresist for pattern transferring

2006-10-24

2006-10-24

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S311000, C430S313000, C430S316000, C430S317000, C430S296000, C430S942000, C430S950000

Reexamination Certificate

active

07125645

ABSTRACT:
A composite photoresist structure includes an first organic layer located on a substrate, a sacrificial layer located on the first organic layer, and a second organic layer located on the sacrificial layer. The first organic layer is made of materials that can be easily removed by plasma. Therefore, the surface of the substrate will not be damaged while transferring a predetermined pattern onto the substrate.

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