Composite diagnostic wafer for semiconductor wafer processing sy

Details Composite diagnostic wafer for semiconductor wafer processing sy Composite diagnostic wafer for semiconductor wafer processing sy

1994-10-31

1995-09-19

Berman, Jack I.

Radiant energy

Electron energy analysis

250397, 25049221, H01J 4948, H01J 37244

Patent

active

054517842

ABSTRACT:
A composite diagnostic wafer containing a placebo wafer having the same dimensions as a semiconductor wafer. The placebo wafer has affixed to one surface one or more ion current probes and one or more ion energy analyzers. As such, measurement instrumentation connected to the analyzer(s) and probe(s) determines ion current and ion energy at various locations on the placebo wafer during plasma generation within a semiconductor wafer processing system.

REFERENCES:
patent: 4246479 (1981-01-01), Gopinathan
patent: 4494005 (1985-01-01), Shibata et al.
patent: 4680468 (1987-07-01), Bouchard et al.
patent: 4831267 (1989-05-01), Brunner
patent: 4849629 (1989-07-01), Daimon et al.
patent: 4980562 (1990-12-01), Berrian et al.
patent: 5068539 (1991-11-01), Nogami et al.
Stenzel et al., "Novel Directional Ion Energy Analyzer", Rev. Sci. Instrum. 53(7), Jul. 1982, pp. 1027-1031.

Affiliated with

Also associated with

Rating

Composite diagnostic wafer for semiconductor wafer processing sy does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Composite diagnostic wafer for semiconductor wafer processing sy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composite diagnostic wafer for semiconductor wafer processing sy will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1829826