Metal working – Barrier layer or semiconductor device making
Patent
1997-11-28
2000-05-30
Graybill, David E.
Metal working
Barrier layer or semiconductor device making
H01L 2100, H01L 2164
Patent
active
060686693
ABSTRACT:
A compliant interconnect for making a temporary (or permanent) electrical connection with a semiconductor die. The compliant interconnect includes raised contacts having penetrating projections for penetrating contact locations on the die (e.g., bond pads) to a limited penetration depth. In an illustrative embodiment the raised contacts are formed on a silicon substrate as raised pillars with a hollow etched interior portion. A tip of the raised contacts is formed as a thin flexible membrane to permit a desired amount of flexure or compliancy under loading from the die held in a test fixture. In an alternate embodiment the raised contacts are formed on a hollow flexible base portion. In another alternate embodiment the raised contacts are formed on a flexible membrane mounted to a support substrate having etched pockets filled with an elastomeric material.
REFERENCES:
patent: 4553192 (1985-11-01), Babuka et al.
patent: 4585991 (1986-04-01), Reid et al.
patent: 4899107 (1990-02-01), Corbett et al.
patent: 4899921 (1990-02-01), Bendat et al.
patent: 4937653 (1990-06-01), Blonder
patent: 5006792 (1991-04-01), Malhi et al.
patent: 5051379 (1991-09-01), Bayer et al.
patent: 5072289 (1991-12-01), Sugimoto et al.
patent: 5073117 (1991-12-01), Malhi et al.
patent: 5088190 (1992-02-01), Malhi et al.
patent: 5090118 (1992-02-01), Kwon et al.
patent: 5103557 (1992-04-01), Leedy
patent: 5123850 (1992-06-01), Elder et al.
patent: 5172050 (1992-12-01), Swapp
patent: 5177439 (1993-01-01), Liu et al.
patent: 5180977 (1993-01-01), Huff
patent: 5225037 (1993-07-01), Elder et al.
patent: 5302891 (1994-04-01), Wood et al.
patent: 5323035 (1994-06-01), Leedy
patent: 5326428 (1994-07-01), Farnworth et al.
patent: 5408190 (1995-04-01), Wood et al.
patent: 5419807 (1995-05-01), Akram et al.
patent: 5440240 (1995-08-01), Wood et al.
patent: 5483741 (1996-01-01), Akram et al.
patent: 5585282 (1996-12-01), Wood et al.
patent: 5596283 (1997-01-01), Mellitz et al.
patent: 5607818 (1997-03-01), Akram et al.
patent: 5625298 (1997-04-01), Hirano et al.
patent: 5686317 (1997-11-01), Akram et al.
patent: 5716218 (1998-02-01), Farnworth et al.
patent: 5869974 (1999-02-01), Akram et al.
Yamamoto, Yasuhiko et al., "Evaluation of New Micron-Connection System Using Microbumps", Technical Paper, Nitto Denko Corporation, ISHM 1993 proceedings, pp. 370-378.
Akram Salman
Farnworth Warren M.
Wood Alan G.
Gratton Stephen A.
Graybill David E.
Micro)n Technology, Inc.
LandOfFree
Compliant interconnect for testing a semiconductor die does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compliant interconnect for testing a semiconductor die, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compliant interconnect for testing a semiconductor die will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1907345