Complementary field effect transistor and its manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S405000, C257S411000, C257S645000, C257S651000, C257SE27062, C257SE27064

Reexamination Certificate

active

07087969

ABSTRACT:
A complementary field effect transistor comprises: a semiconductor substrate; an n-type field effect transistor provided on the semiconductor substrate; and a p-type field effect transistor provided on the semiconductor substrate. The n-type field effect transistor has: a first gate insulating film containing an oxide including an element selected from the group consisting of group IV metals and Lanthanoid metals, and further containing a compound of the element and a group III element; a first gate electrode provided on the first gate insulating film; and n-type source and drain regions formed on both sides of the first gate electrode. The p-type field effect transistor has: a second gate insulating film containing an oxide including an element selected from the group consisting of group IV metals and Lanthanoid metals, and including substantially no positive charge; a second gate electrode provided on the second gate insulating film; and p-type source and drain regions provided on both sides of the second gate electrode.

REFERENCES:
patent: 6020243 (2000-02-01), Wallace et al.
patent: 6376888 (2002-04-01), Tsunashima et al.
patent: 6525380 (2003-02-01), Shirahata et al.
patent: 6593618 (2003-07-01), Kamata et al.
patent: 6680245 (2004-01-01), King et al.
patent: 2002/0135030 (2002-09-01), Horikawa
patent: 2003/0122199 (2003-07-01), Koyama et al.
patent: 2004/0142579 (2004-07-01), Morita et al.
patent: 48-30709 (1973-09-01), None
patent: 51-45438 (1976-12-01), None

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