Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate
2011-04-12
2011-04-12
Glick, Edward J (Department: 2882)
Photocopying
Projection printing and copying cameras
Focus or magnification control
C355S077000
Reexamination Certificate
active
07924405
ABSTRACT:
A method for lithography patterning includes providing a mask for photolithography patterning; measuring a mask flatness of the mask; calculating focal deviation of imaging the mask to a substrate in a lithography apparatus; adjusting the lithography apparatus to have a compensated focal plane of the mask based on the focal deviation; and exposing the semiconductor substrate utilizing the mask and the lithography apparatus with adjusted focal plane.
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Chen Chia-Jen
Lee Hsin-Chang
Wang Tzu-Yi
Yeh Lee-Chih
Glick Edward J
Haynes and Boone LLP
Persaud Deoram
Taiwan Semiconductor Manufacturing Company , Ltd.
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