Compensation of reflective mask effects in lithography systems

Details Compensation of reflective mask effects in lithography systems Compensation of reflective mask effects in lithography systems

2006-04-04

2006-04-04

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

Reexamination Certificate

active

07022443

ABSTRACT:
Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.

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patent: 6787789 (2004-09-01), Van Der Laan
patent: 2004/0013956 (2004-01-01), Sogard

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