Compensation component and method for fabricating the component

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S262000, C257S328000, C257S335000, C257S653000

Reexamination Certificate

active

06878997

ABSTRACT:
A compensation component, in which a lateral section and, at least at one end of the lateral section, a section that is inclined with respect to the surface of a drift path, includes n-conducting and p-conducting regions completely embedded in a semiconductor body without a trench. In such a case, the inclined section is formed by ion implantation through an implantation mask with an inclined edge.

REFERENCES:
patent: 4754310 (1988-06-01), Coe
patent: 5216275 (1993-06-01), Chen
patent: 5438215 (1995-08-01), Tihanyi
patent: 6081009 (2000-06-01), Neilson
patent: 6294818 (2001-09-01), Fujihira
patent: 6465869 (2002-10-01), Ahlers et al.
patent: 6734462 (2004-05-01), Shah
patent: 6768169 (2004-07-01), Tihanyi
patent: 6768171 (2004-07-01), Disney
patent: 20010048144 (2001-12-01), Ahlers et al.
patent: 100 26 924 (2001-12-01), None

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