Compensated linearity voltage-control-capacitor device by...

Semiconductor device manufacturing: process – Voltage variable capacitance device manufacture

Reexamination Certificate

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C438S382000, C257S595000

Reexamination Certificate

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10828884

ABSTRACT:
Apparatus and method of providing a CMOS varactor device having improved linearity. At least two differential varactor elements are connected in parallel. Each of the differential elements includes first, second and third doped regions in a well. A first gate controls the first and second regions and a second gate controls the second and third regions. A resistor is formed such that power applied to the bulk region of the two differential elements will differ by the voltage drop across the resistor.

REFERENCES:
patent: 6407412 (2002-06-01), Iniewski et al.
patent: 6465830 (2002-10-01), Babcock et al.
patent: 6521939 (2003-02-01), Yeo et al.
patent: 6878983 (2005-04-01), Coolbaugh et al.
patent: 6882029 (2005-04-01), Gau et al.
patent: 6943399 (2005-09-01), Gau
patent: 2003/0082461 (2003-05-01), Carpi
patent: 2003/0136992 (2003-07-01), Adan
patent: 2004/0188795 (2004-09-01), Ohkubo et al.
patent: 2005/0212609 (2005-09-01), Jasa et al.
patent: 2006/0006431 (2006-01-01), Jean et al.
Su, C.Y. et al., “Scalable RF MIS varactor model,”Electronics Letters, vol. 37 No. 12 (Jun. 7, 2001) pp. 760-761.

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