Semiconductor device manufacturing: process – Miscellaneous
Patent
1997-09-02
1999-03-16
Tsai, Jey
Semiconductor device manufacturing: process
Miscellaneous
438907, 438908, 438905, 414935, 414939, H01L 2100
Patent
active
058830170
ABSTRACT:
A process chamber for semiconductor wafers is formed of multiple compartments. A first compartment is provided for supplying an isolated environment for processing the wafers, and a second compartment is provided, in selective communication with the first compartment, to load and unload wafers from the chamber. The wafer handling equipment is located in the second compartment to isolate it from the process environment, and thus form a clean, non-contaminating, environment for the wafer handling equipment. When the chamber must be cleaned, only the first compartment must be cleaned, as no processing occurs in the second chamber. Therefore, the entire first chamber may be removed for cleaning, and replaced with a clean first compartment to decrease chamber turnaround time during chamber cleaning operations.
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Olgado Donald
Tepman Avi
Yin Gerald Zheyao
Applied Materials Inc.
Biksa Janis
Tsai Jey
Zarneke David A.
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