Explosive and thermic compositions or charges – Fume or waste affecting
Patent
1999-12-10
2000-08-29
Nelson, Peter A.
Explosive and thermic compositions or charges
Fume or waste affecting
1491096, 102292, 264 31, 264 34, 100 45, D03D 2300, C06D 506, C06B 2100
Patent
active
061103071
ABSTRACT:
The present invention relates to a compacting process suitable particularly for the compacting of materials with a pyrophoric tendency and especially for the compacting of scrap metal generated in the nuclear industry: and compacting means (4), and a compacting device including said means (4), appropriate for the implementation of said process. In said process the blanketed materials are compacted with optimized complementary external blanketing. The inert gas used for said external blanketing is characteristically conveyed via the compacting means (4) and blown in through their lower end (15).
REFERENCES:
patent: 4198201 (1980-04-01), Shaw et al.
patent: 4347087 (1982-08-01), Zeller et al.
patent: 4625648 (1986-12-01), Klein et al.
patent: 4983235 (1991-01-01), Nyqvist et al.
patent: 4994212 (1991-02-01), Vos et al.
patent: 5114630 (1992-05-01), Newman et al.
patent: 5354520 (1994-10-01), Oliver et al.
patent: 5463169 (1995-10-01), Hebisch et al.
patent: 5472647 (1995-12-01), Blau et al.
patent: 5731540 (1998-03-01), Flanigan et al.
patent: 5886293 (1999-03-01), Nauflett et al.
Cano, heir by Agnes Fernande
Guerin, deceased Jean-Claude
Guerin, heir by Christiane
Guerin, heir by Jean-Baptiste
Guerin, heir by Pierre Emmanuel
Compagnie Generale des Matieres Nucleaires
Nelson Peter A.
LandOfFree
Compacting process and compacting means and device suitable for does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compacting process and compacting means and device suitable for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compacting process and compacting means and device suitable for will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1245672