Combining multiple reference measurement collections into a...

Details Combining multiple reference measurement collections into a... Combining multiple reference measurement collections into a...

2006-09-12

2006-09-12

Barlow, John (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

C702S189000

Reexamination Certificate

active

07107177

ABSTRACT:
Combining of reference measurement collections (RMCs) of at least three reference measurement systems into a weighted reference measurement collection (wRMC) is disclosed. Each RMC includes a plurality of corresponding sample measurements, each of which has a measurement value of the same sample. The invention plots corresponding measurement values to generate a plurality of data pairs for each possible RMC pairing. A best-fit line of the plurality of data pairs for each RMC pairing is then generated, and a residual for each data pair is calculated. A weight is then assigned to each sample measurement for each RMC based on the residuals associated with a respective RMC to which the sample measurement belongs, favoring a smaller residual more than a larger residual. A weighted reference measurement is then generated based on the weights, and the measurement value for the respective sample measurement for each RMC.

REFERENCES:
patent: 2003/0187840 (2003-10-01), Laughery et al.
Sendelbach, M. et al., “Scatterometry Measurement Precision and Accuracy Below 70 nm,” Metrology, Inspection, and Process Control for Microlithography XVII, Proceedings of SPIE, vol. 5038, pp. 224-238, 2003.

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