Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-07-25
2006-07-25
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192150, C204S192160, C204S192300
Reexamination Certificate
active
07081186
ABSTRACT:
A PVD process for coating substrates, wherein the substrate is pre-treated in the vapor of a pulsed, magnetic field-assisted cathode sputtering operation, and during pre-treatment a magnetic field arrangement of the magnetron cathode type, with a strength of the horizontal component in front of the target of 100 to 1500 Gauss, is used for magnetic field-assistance, and after pre-treatment further coating is effected by means of cathode sputtering and the power density of the pulsed discharge during pre-treatment is greater than 1000 W.cm−2.
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patent: 6296742 (2001-10-01), Kouznetsov
patent: 10124749 (2002-11-01), None
patent: 1260603 (2002-11-01), None
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Munz, W.-D., “Wear Resistant PVD Coatings for High Temperature (950° C) Applications”, Annual Conference, Chicago, Apr. 17-22, 1999, p. 350-356.
Schonjahn, C., Donahue, L.A., Lewis, D.B., and Munz, W.-D., “Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition system”, Journal of Vacuum Science and Technology, vol. 18, Issue 4, 2000, p. 1718-1723.
Munz, W.-D., Smith, I.J., Lewis, D.B., and Creasy, S., “Droplet formation on steel substrates during cathodic steered arc metal ion etching”, Vacuum, vol. 48, Issue 5, 1997, p. 473-481.
Wang, H.W., Stack, M.M., Lyon, S.B., Hovsepian, P., and Munz, W.-D., “The corrosion behaviour of macroparticle defects in arc bond-sputtered CrN/NbN superlattice coatings”, Surface and Coatings Technology, vol. 126, 2000, p. 279-287.
Ehiasarian, A.P., New., R., Munz, W.-D., Hultman, L., Helmersson, U., and Kouznetsov, V., “Influence of high power densities on the composition of pulsed magnetron plasmas”, Vacuum, vol. 65, 2002, p. 147-154.
Ehiasarian Arutiun Papken
Hovsepian Papken Ehiasar
Munz Wolf-Dieter
McDonald Rodney G.
Sheffield Hallam University
Trexler, Bushnell, Giangiorgi & Blackstone & Marr, Ltd
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