Combination process of vacuum sputtering and wet coating for...

Details Combination process of vacuum sputtering and wet coating for... Combination process of vacuum sputtering and wet coating for...

2001-06-21

2002-11-12

Ryan, Patrick (Department: 1745)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192150, C204S192260, C204S192270, C204S192290, C427S162000, C427S164000, C427S166000, C427S163100

Reexamination Certificate

active

06478932

ABSTRACT:

BACKGROUND OF THE INVENTION
The present invention relates to a coating process composed of an optically effective layer system, for CRT glass substrate, whereby the layer system has a high anti-reflection, low resistivity, and light-attenuation effect. More specifically the invention relates to a combination of vacuum sputtering process which produce high conductivity of oxide films and a wet process which produce silica overcoat from traditional spin coating.
U.S. Pat. No. 4,945,282, whose disclosure is an image display panel having anti-static film with transparent and electro-conductive properties and process for processing same. The layer system including, SnO
2
, In
2
O
3
, Sb
2
O
3
, and SiO
2
. All the thin films of the layer system are produce by wet chemical process. There are 2 layers in the layer system. For a given example, the total thickness of the 2-layer structure was up to 2000 angstroms. The materials and thickness of the two films are antistatic coat (SnO
2
, In
2
O
3
, Sb
2
O
3
), 50-800 angstroms and SiO
2
, 1000±200 angstroms respectively.
U.S. Pat. No. 5,976,684, whose disclosure is an organic substrate provided with a light absorptive antireflection film and process for its production. The layer system including an organic substrate with acrylic hard coat layer, SiN, TiN and SiO
2
. The thin films of the SiN, TiN and SiO
2
layer are produced by vacuum sputtering process. There are 3 to 4 thin layers in the layer system. For a given example, the total thickness of the 4-layer structure was about 1000 angstroms. The materials and thickness of the two thicker films of the 4-layer structure are TiN, 20-200 angstroms and SiO
2
, 600-1100 angstroms respectively.
U.S. Pat. No. 4,921,760, whose disclosure is a multi-layer anti-reflection coating with excellent adhesion between CeO
2
layer and synthetic resin. The layer system including CeO
2
, Al
2
O
3
, ZrO
2
, SiO
2
, TiO
2
and Ta
2
O
5
. All the thin films of the layer system are produce by vacuum evaporation or sputtering process. There are 3 to 5 thin layers in the layer system. For a given example, the total thickness of the 5-layer structure was about 3580 angstroms. The materials and thickness of the two thicker films of the 5-layer structure are CeO
2
, 1360 angstroms and SiO
2
, 1220 angstroms respectively.
U.S. Pat. No. 5,105,310, whose disclosure is a multi-layer anti-reflection coating designed for deposition in in-line coating marching by reactive sputtering. The layer system including TiO
2
, SiO
2
, ZnO, ZrO
2
and Ta
2
O
5
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 6-layer structure was about 4700 Angstroms. The materials and thickness of two thicker film of the layer system are ZnO, 1370 Angstroms and SiO
2
, 1360 Angstroms respectively.
U.S. Pat. No. 5,091,244 and 5,407,733, disclosed a new type electric conductive light-attenuating anti-reflection coating. The major claim is an article comprision of nitrides of certain transition metal to provided an electrically-conductive, light-attenuating, anti-reflection surfaces. The layer systems including TiN, NbN, SnO
2
, SiO
2
, Al
2
O
3
, and Nb
2
O
5
. The thin films of the layer system are nitride and oxide materials. There are 3 to 4 thin layers in the layer system. For a given example, the total thickness of the 4-layer structure was about 1610 Angstroms. The materials and thickness of the two thicker films of the layer system are ZnO, 650 Angstroms and SiO
2
, 820 Angstroms, respectively. The transmission of visible light of these two layer systems is below 50%. All the thin films of the. layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,147,125, whose disclosure is a multi-layer, anti-reflection coating using zinc oxide to provide UV rejection for wave-lengths shorter than 380 nm. The layer system including TiO
2
, SiO
2
, ZnO, and MgF
2
. All the thin films of the layer system are produced from vacuum evaporation or sputtering process. There are 4 to 6 thin layers in the layer system. For a given example, the total thickness of the 5-layer structure was about. 7350 Angstroms. The materials and thickness of the two thicker films of the layer system are ZnO, 4390 Angstroms and MgF
2
, 1320 Angstroms, respectively. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,170,291 disclose a 4-layer system which is optical effective and has a high anti-reflective effect. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical deposition method. The layer system including SiO
2
, TiO
2
, Al
2
O
3
, ZnS, MgO and Bi
2
O
3
. For a given sample, the total thickness of the 4-layer structure was about 2480 Angstroms. The materials and thickness of the two major films of the layer system are TiO
2
, 1040 Angstroms and SiO
2
, 940 Angstroms, Respectively.
U.S. Pat. No. 5,216,542 whose disclosure is a 5 layer coating with high anti-reflection effect. The process use an adhesive layer of Ni, Cr or NiCr metal with a thickness about 1 nm (manometer). Other four layers are compose of SnO
2
, ZrO
2
, ZnO, Ta
2
O
5
, NiO, CrO
2
, TiO
2
, Sb
2
O
3
, In
2
O
3
, Al
2
O
3
,SiO
2
, TiN and ZrN. For a given example, the total thickness of the 5 layer structure was about 2337 angstroms. The materials and thickness of the two majority films of the layer system are TiO
2
, 500 Angstroms and SiO
2
, 1387 Angstroms, respectively. The transmission of visible light of this layer system is below 30%. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,541,770 whose disclosure is a light attenuating anti-reflection coating including electrically conductive layers. It is a four or five layer system. A light absorption high refractive index metal such as Cr, Mo and W was used as a optically effective thin film in the layer system. The other three or four layers are TiO
2
, ITO, Al
2
O
3
, SiO
2
and TiN. The patent shows that the majority materials of the layer system are oxide and nitride; only one metal film was used as an optical effective thin film in the anti-reflection coating. All the thin films of the layer system are produced by vacuum evaporation or sputtering process. For a given example, the total thickness of the 5-layer structure was about 1495 angstroms. The materials and thickness of the majority films of the layer system are ITO, 334 Angstroms and SiO
2
, 720 Angstroms. The transmission of visible light of this layer system is below 60%.
U.S. Pat. No. 5,362,552 whose disclosure is a 6-layer anti-reflection coating includes three layers of electrically-conductive metal oxide. The layer system including SiO
2
, ITO, Nb
2
O
5
, and Ta
2
O
5
. Up to a total optical thickness of about one-wavelength of visible light of the electrically conductive metal oxide may be included in the coating. For one of given example of 6 layer structure, the materials and thickness of the majority two layers within this 6 layer system are SiO
2
, 854 Angstroms and ITO 1975 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. No. 5,579,162 disclosed a 4-layer anti-reflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. The layer system including SnO
2
, SiO
2
and ITO. For one of given example of the 4 layer structure, the materials and thickness of the majority two layers within this system are SnO
2
, 763 Angstroms and SiO
2
940 Angstroms. All the thin films of the layer system are produced by vacuum evaporation or sputtering process.
U.S. Pat. Nos. 5,728,456 and 5,783,049, disclosed an improved way to deposit anti-reflection coating on plastic film. The multi

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