Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-08-16
2005-08-16
Tran, Michael (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C427S271000, C438S745000, C438S770000
Reexamination Certificate
active
06930057
ABSTRACT:
To provide a method for manufacturing a magnetic recording medium which creates anodically oxidized aluminum nanoholes so as to have a rectangular or elliptical sectional shape and gives shape anisotropy to a magnetic material filled in the nanoholes to thereby always fix a relative positional relation between magnetizations of the magnetic material and a magnetic head that detects the magnetizations. The method for manufacturing a magnetic recording medium includes: preparing a member having regularly arranged plural pits; subjecting the member to anodic oxidation treatment so that formation of holes is started with the pits as starting points, and a porous region, which has a first portion where the holes are formed without branching and a second portion where branched holes are formed, is formed; filling a magnetic material in the formed holes; and removing the non-branching portions of the holes.
REFERENCES:
patent: 6709513 (2004-03-01), Fukunaga et al.
patent: 6750153 (2004-06-01), Beetz et al.
patent: H06-028093 (1994-02-01), None
patent: H10-121292 (1998-05-01), None
patent: H11-224422 (1999-08-01), None
patent: 2000-277330 (2000-10-01), None
English Abstract corresponding to JP 2000-277330.
English Abstract corresponding to JP H10-121292.
English Abstract corresponding to JP H11-224422.
English Abstract corresponding to JP H06-028093.
Den Tohru
Saito Tatsuya
Berry Renee R.
Morgan & Finnegan , LLP
Tran Michael
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