Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2007-05-15
2007-05-15
Whitehead, Jr., Carl (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
Reexamination Certificate
active
10485695
ABSTRACT:
The invention relates to very small-sized color image sensors.The sensor according to the invention is made by the following method:the formation, on the front face of the semiconductive wafer (10), of a series of active zones (ZA) comprising image detection circuits and each corresponding to a respective image sensor, each active zone comprising photosensitive zones (12) covered with conductive and insulating layers (14, 16) enabling the collection of electrical charges generated in the photosensitive zones,the transfer of the wafer (10) by its front face against the front face of a supporting substrate (20),the elimination of the major part of the thickness of the semiconductive wafer, leaving a very fine semiconductive layer (30) on the substrate, this fine semiconductive layer comprising the photosensitive zones,the deposition and etching of color filters (18) on the semiconductive layer thus thinned.
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Brissot Louis
Jutant Alain
Pourquier Eric
Rommeveaux Philippe
Simon Gilles
Atmel Grenoble S.A.
Harrison Monica D.
Jr. Carl Whitehead
Lowe Hauptman & Berner LLP
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