Color filter with resist material in scribe lines

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

Reexamination Certificate

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Details

C257S233000, C257S234000, C438S070000

Reexamination Certificate

active

06956253

ABSTRACT:
A color filter includes a substrate having a plurality of scribe lines arranged to form at least one filter region surrounded by the scribe lines. The scribe lines are at least partially filled with a resist material. At least one color resist layer is formed above the substrate within the at least one filter region.

REFERENCES:
patent: 6171885 (2001-01-01), Fan et al.
patent: 6274917 (2001-08-01), Fan et al.
patent: 6395576 (2002-05-01), Chang et al.
patent: 6482669 (2002-11-01), Fan et al.
patent: 6495813 (2002-12-01), Fan et al.
patent: 6582988 (2003-06-01), Hsiao et al.
patent: 6632700 (2003-10-01), Fan et al.
Press Release, Hsin-Chu, Taiwan—(Business Wire)—May 15, 2000—“TSMC begins volume production of CMOS image sensors” http://www.dpreview.com
ews/0005/00051503tsmc_cmos.asp, 3 pages, visited Mar. 11, 2003.

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