Collector unit with a reflective element for illumination...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S461100, C378S034000

Reexamination Certificate

active

07084412

ABSTRACT:
There is provided a collector unit for illumination systems with a wavelength of ≦193 nm, preferably ≦126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.

REFERENCES:
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patent: WO 01/09681 (2001-02-01), None
patent: WO 02/12928 (2002-02-01), None
patent: WO 02/099534 (2002-12-01), None
Étude Preéliminaire D'Objectifs Catadioptriques A Rayons X Utilisant La Réflexion Totale Ou Les Multicouches Pour Le Diagnostic Des Plasmas, Horizons de l'Optique 83, J. Optics (Paris),1984, vol. 15, n° 4 bis, pp. 270-280.
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Wolter, “Annalen der Physik” (Annals of Physics) 10, 94-114, 1952.

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