Cold/dry substrate treatment technique which improves photolitho

Details Cold/dry substrate treatment technique which improves photolitho Cold/dry substrate treatment technique which improves photolitho

1981-12-18

1984-12-25

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430271, 430272, 430315, 430935, 430312, 174 685, G03C 500

Patent

active

044904576

ABSTRACT:
A limitation in the use of ceramic substrates for electronic packaging is that photolithographic processes applied to such substrate surfaces do not give the highest resolution that the process is capable of because of inherent surface topographical variations on the ceramic substrate. A smoothing layer of a dry film glazed photosensitive material, such as RISTON solder mask, is laminated over the substrate surface, exposed with UV and cured. Metal conductor lines are then bonded onto the surface of the solder mask layer.

REFERENCES:
patent: 3606679 (1971-09-01), Schroeder
patent: 3873313 (1975-03-01), Horst et al.
patent: 4064287 (1977-12-01), Lipson et al.
patent: 4167413 (1979-09-01), Christ et al.

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