Coil and coil feedthrough

Details Coil and coil feedthrough Coil and coil feedthrough

1998-10-15

2000-10-31

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723I, 20429808, 20429812, H01L 213065

Patent

active

061396796

ABSTRACT:
A coil for a plasma chamber in a semiconductor fabrication process comprises a continuous, one-piece conductive conduit having a first end and a second end positioned on the chamber exterior, a coil portion positioned in the chamber interior and a feedthrough portion positioned in an aperture of the chamber wall. Because the conduit lacks any joints between the feedthrough and the interior coil portions, a potential source of coolant leak is eliminated.

REFERENCES:
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patent: 4725449 (1988-02-01), Ehlers et al.
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patent: 4941915 (1990-07-01), Matsuoka et al.
patent: 5521351 (1996-05-01), Mahoney
patent: 5560776 (1996-10-01), Sugai et al.
patent: 5683537 (1997-11-01), Ishii
patent: 5690781 (1997-11-01), Yoshida et al.
patent: 5855685 (1999-01-01), Tobe et al.
patent: 5998933 (1999-12-01), Shun'Ko
PCT Search Report issued Sep. 8, 1998 in PCT Appln No. PCT/US98/09739.
Kurt J. Lesker Company, Ferrofluidics Feedthroughs, Catalog pp. 14-10 and 14-12, dated prior to May, 8, 1997.

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